ʻO ke aniani ʻo Ito no ka pale emi a me nā pale paʻi
Nā kiʻi huahana
Hana ʻia ke aniani hoʻoheheʻe conductive ITO ma ka hoʻolaha ʻana i ka silicon dioxide (SiO2) a me ka indium tin oxide (ʻike ʻia ʻo ITO) layer e ka magnetron sputtering technology ma ke aniani substrate ma lalo o ke ʻano maloʻo holoʻokoʻa, e hana ana i ka conductive alo i uhi ʻia, ʻo ITO he pūhui metala me ka mālamalama maikaʻi. conductive properties.
ʻikepili ʻenehana
| ITO mānoanoa aniani | 0.4mm,0.5mm,0.55mm,0.7mm,1mm,1.1mm,2mm,3mm,4mm | ||||||||
| kūʻē | 3-5Ω | 7-10Ω | 12-18Ω | 20-30Ω | 30-50Ω | 50-80Ω | 60-120Ω | 100-200Ω | 200-500Ω |
| uhi mānoanoa | 2000-2200Å | 1600-1700Å | 1200-1300Å | 650-750Å | 350-450Å | 200-300Å | 150-250Å | 100-150Å | 30-100Å |
| Kūʻē aniani | |||
| ʻAno kūʻē | kūʻē haʻahaʻa | kūʻē maʻamau | kūʻē kiʻekiʻe |
| Wehewehe | <60Ω | 60-150Ω | 150-500Ω |
| Palapala noi | Hoʻohana pinepine ʻia ke aniani kūpaʻa kiʻekiʻe no ka pale electrostatic a me ka hana ʻana i ka pale | Hoʻohana pinepine ʻia ke aniani kūpaʻa maʻamau no ka TN type liquid crystal display and electronic anti-interference (EMI shielding) | Hoʻohana maʻamau ʻia ke aniani kūpaʻa haʻahaʻa i nā hōʻike aniani wai STN a me nā papa kaapuni māmā |
| ʻO ka ho'āʻo hana a me ka ho'āʻo hilinaʻi | |
| Hoʻomanawanui | ±0.2mm |
| Warpage | mānoanoa<0.55mm, warpage≤0.15% mānoanoa>0.7mm, warpage≤0.15% |
| ZT kū pololei | ≤1° |
| ʻoʻoleʻa | >7H |
| ʻO ka hoʻāʻo ʻana abrasion uhi | 0000# huluhulu kila me 1000gf,6000 mau kaʻina, 40 mau pōkole / min |
| Ho'āʻo anti corrsion | ʻO ka manaʻo o ka NaCL 5%:Mahana: 35°CKa manawa hoʻokolohua: 5min hoʻololi kū'ē≤10% |
| ʻO ka hoʻāʻo kūpaʻa haʻahaʻa | 60℃,90%RH,48 hola hoʻololi kū'ē≤10% |
| ʻO ka hoʻāʻo kūʻē ʻana i ka waika | HCL manaʻo: 6%, Mahana: 35°CKa manawa hoʻokolohua: 5min hoʻololi kū'ē≤10% |
| ʻO ka hoʻāʻo kūʻē alkali | NaOH hoʻopalekana: 10%, Mahana: 60°CKa manawa hoʻokolohua: 5min hoʻololi kū'ē≤10% |
| Paʻa kumu | Mahana:300°Cmanawa wela: 30min hoʻololi kū'ē≤300% |
Kaʻina hana
ʻO ka papa Si02:
(1) Ke kuleana o ka papa SiO2:
ʻO ke kumu nui, ʻo ia ka pale ʻana i nā ion metala i loko o ka substrate soda-calcium mai ka laha ʻana i ka papa ITO.Hoʻopili ia i ka conductivity o ka papa ITO.
(2) Kiʻiʻoniʻoni mānoanoa o ka papa SiO2:
ʻO ka mānoanoa kiʻiʻoniʻoni maʻamau he 250 ± 50 Å
(3) ʻO nā mea ʻē aʻe i ka papa SiO2:
ʻO ka maʻamau, i mea e hoʻomaikaʻi ai i ka transmittance o ke aniani ITO, ua doped kekahi hapa o SiN4 i SiO2.
| KUE ANIANI | ||||||
| ANO | kūʻē haʻahaʻa | kūʻē maʻamau | kūʻē kiʻekiʻe | |||
| Wehewehe | <60Ω | 60-150Ω | 150-500Ω | |||
| Palapala noi | Hoʻohana pinepine ʻia ke aniani kūpaʻa kiʻekiʻe no ka pale electrostatic a me ka hana ʻana i ka pale | Hoʻohana pinepine ʻia ke aniani kūpaʻa maʻamau no ka TN type liquid crystal display and electronic anti-interference (EMI shielding) | Hoʻohana maʻamau ʻia ke aniani kūpaʻa haʻahaʻa i nā hōʻike aniani wai STN a me nā papa kaapuni māmā | |||
Pili pili
Ke aniani Ito no ka hōʻike pale kaua Emi
Aniani i uhi ia no ka Hmi Touch Panel
Keaniani Conductive Tempered Ito no ka unahi kino










